PREVENTION OF STATIC IN LIGHT-SENSITIVE PHOTOGRAPHIC MATERIALS USING BISAMINIMIDE COMPOUNDS

1374779 Photographic antistatic agents KONISHIROKU PHOTO INDUSTRY Co Ltd 17 Dec 1971 [18 Dec 1970] 58663/71 Heading G2C [Also in Division C2] Antistatic compounds for use in a light-sensitive silver halide photographic emulsion or element or a photographic treatment bath (e.g. a developing solution,...

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Hauptverfasser:	WADA T,JA, ISHIHARA M,JA, YAMAGUCHI H,JA, SUGITA S,JA
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES AUXILIARY PROCESSES IN PHOTOGRAPHY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DYES ELECTROGRAPHY HOLOGRAPHY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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