container_end_page
container_issue
container_start_page
container_title
container_volume
creator OLGA DEMIDOVNA JURINA
BORIS ARISTARKHOVICH DOGADKIN
ANASTASIA VASILIEVNA LARINA
SOFIA FADEEVNA NAUMOVA
VLADIMIR VLADIMIROVICH MARKOV
JURY SERGEEVICH BOKOV
GALINA DMITRIEVNA YAROVAYA
NINEL VLADIMIROVNA VIKULINA
BORIS VASILIEVICH EROFEEV
VADIM PETROVICH LAVRISCHEV
description
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US3674496A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US3674496A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US3674496A3</originalsourceid><addsrcrecordid>eNrjZFD0c3V3DPEMc1Xw8XT3CNENdvUL9gTzfR1DXIM8HX14GFjTEnOKU3mhNDeDvJtriLOHbmpBfnxqcUFicmpeakl8aLCxmbmJiaWZozFhFQCoWSHB</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>NEGATIVE LIGHT-SENSITIVE MATERIAL</title><source>esp@cenet</source><creator>OLGA DEMIDOVNA JURINA ; BORIS ARISTARKHOVICH DOGADKIN ; ANASTASIA VASILIEVNA LARINA ; SOFIA FADEEVNA NAUMOVA ; VLADIMIR VLADIMIROVICH MARKOV ; JURY SERGEEVICH BOKOV ; GALINA DMITRIEVNA YAROVAYA ; NINEL VLADIMIROVNA VIKULINA ; BORIS VASILIEVICH EROFEEV ; VADIM PETROVICH LAVRISCHEV</creator><creatorcontrib>OLGA DEMIDOVNA JURINA ; BORIS ARISTARKHOVICH DOGADKIN ; ANASTASIA VASILIEVNA LARINA ; SOFIA FADEEVNA NAUMOVA ; VLADIMIR VLADIMIROVICH MARKOV ; JURY SERGEEVICH BOKOV ; GALINA DMITRIEVNA YAROVAYA ; NINEL VLADIMIROVNA VIKULINA ; BORIS VASILIEVICH EROFEEV ; VADIM PETROVICH LAVRISCHEV</creatorcontrib><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><creationdate>1972</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19720704&amp;DB=EPODOC&amp;CC=US&amp;NR=3674496A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19720704&amp;DB=EPODOC&amp;CC=US&amp;NR=3674496A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OLGA DEMIDOVNA JURINA</creatorcontrib><creatorcontrib>BORIS ARISTARKHOVICH DOGADKIN</creatorcontrib><creatorcontrib>ANASTASIA VASILIEVNA LARINA</creatorcontrib><creatorcontrib>SOFIA FADEEVNA NAUMOVA</creatorcontrib><creatorcontrib>VLADIMIR VLADIMIROVICH MARKOV</creatorcontrib><creatorcontrib>JURY SERGEEVICH BOKOV</creatorcontrib><creatorcontrib>GALINA DMITRIEVNA YAROVAYA</creatorcontrib><creatorcontrib>NINEL VLADIMIROVNA VIKULINA</creatorcontrib><creatorcontrib>BORIS VASILIEVICH EROFEEV</creatorcontrib><creatorcontrib>VADIM PETROVICH LAVRISCHEV</creatorcontrib><title>NEGATIVE LIGHT-SENSITIVE MATERIAL</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1972</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD0c3V3DPEMc1Xw8XT3CNENdvUL9gTzfR1DXIM8HX14GFjTEnOKU3mhNDeDvJtriLOHbmpBfnxqcUFicmpeakl8aLCxmbmJiaWZozFhFQCoWSHB</recordid><startdate>19720704</startdate><enddate>19720704</enddate><creator>OLGA DEMIDOVNA JURINA</creator><creator>BORIS ARISTARKHOVICH DOGADKIN</creator><creator>ANASTASIA VASILIEVNA LARINA</creator><creator>SOFIA FADEEVNA NAUMOVA</creator><creator>VLADIMIR VLADIMIROVICH MARKOV</creator><creator>JURY SERGEEVICH BOKOV</creator><creator>GALINA DMITRIEVNA YAROVAYA</creator><creator>NINEL VLADIMIROVNA VIKULINA</creator><creator>BORIS VASILIEVICH EROFEEV</creator><creator>VADIM PETROVICH LAVRISCHEV</creator><scope>EVB</scope></search><sort><creationdate>19720704</creationdate><title>NEGATIVE LIGHT-SENSITIVE MATERIAL</title><author>OLGA DEMIDOVNA JURINA ; BORIS ARISTARKHOVICH DOGADKIN ; ANASTASIA VASILIEVNA LARINA ; SOFIA FADEEVNA NAUMOVA ; VLADIMIR VLADIMIROVICH MARKOV ; JURY SERGEEVICH BOKOV ; GALINA DMITRIEVNA YAROVAYA ; NINEL VLADIMIROVNA VIKULINA ; BORIS VASILIEVICH EROFEEV ; VADIM PETROVICH LAVRISCHEV</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US3674496A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1972</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>OLGA DEMIDOVNA JURINA</creatorcontrib><creatorcontrib>BORIS ARISTARKHOVICH DOGADKIN</creatorcontrib><creatorcontrib>ANASTASIA VASILIEVNA LARINA</creatorcontrib><creatorcontrib>SOFIA FADEEVNA NAUMOVA</creatorcontrib><creatorcontrib>VLADIMIR VLADIMIROVICH MARKOV</creatorcontrib><creatorcontrib>JURY SERGEEVICH BOKOV</creatorcontrib><creatorcontrib>GALINA DMITRIEVNA YAROVAYA</creatorcontrib><creatorcontrib>NINEL VLADIMIROVNA VIKULINA</creatorcontrib><creatorcontrib>BORIS VASILIEVICH EROFEEV</creatorcontrib><creatorcontrib>VADIM PETROVICH LAVRISCHEV</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OLGA DEMIDOVNA JURINA</au><au>BORIS ARISTARKHOVICH DOGADKIN</au><au>ANASTASIA VASILIEVNA LARINA</au><au>SOFIA FADEEVNA NAUMOVA</au><au>VLADIMIR VLADIMIROVICH MARKOV</au><au>JURY SERGEEVICH BOKOV</au><au>GALINA DMITRIEVNA YAROVAYA</au><au>NINEL VLADIMIROVNA VIKULINA</au><au>BORIS VASILIEVICH EROFEEV</au><au>VADIM PETROVICH LAVRISCHEV</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>NEGATIVE LIGHT-SENSITIVE MATERIAL</title><date>1972-07-04</date><risdate>1972</risdate><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US3674496A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
title NEGATIVE LIGHT-SENSITIVE MATERIAL
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-16T13%3A50%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=OLGA%20DEMIDOVNA%20JURINA&rft.date=1972-07-04&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS3674496A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true