PHOTORESIST-FORMING COMPOSITIONS

1,223,632. Photocrosslinkable compositions. KONISHIBOKU PHOTO INDUSTRY CO. Ltd. 24 April, 1968 [25 April, 1967], No. 19469/68. Heading C3P. [Also in Division G2] A photoresist-forming (photocrosslinkable) composition comprises (a) a photoactivator containing a polyhalogenated methyl group which is c...

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description 1,223,632. Photocrosslinkable compositions. KONISHIBOKU PHOTO INDUSTRY CO. Ltd. 24 April, 1968 [25 April, 1967], No. 19469/68. Heading C3P. [Also in Division G2] A photoresist-forming (photocrosslinkable) composition comprises (a) a photoactivator containing a polyhalogenated methyl group which is capable of forming a free radical on exposure to light and (b) a polymer consisting of or containing units of the formula wherein A is H or a carboxylic acid or amide group, X is a divalent organic group, R 1 is H or C 1 -C 3 alkyl, R 2 is H, C 1 -C 3 alkyl or a substituted or unsubstituted phenyl group, and each of R 3 and R 4 , which may be the same or different, is H or C 1 -C 3 alkyl, with the proviso that in Formula II R 2 and R 3 , together with the N atom and benzene nucleus may form a heterocyclic ring system, or R 3 and R 4 together with the benzene nucleus may form a naphthalene ring system. Polymer (b) may be a homopolymer or a copolymer additionally containing units of one or more other monomers, e.g. styrene, acrylonitrile, vinyl acetate, acrylic, methacrylic or α- chloroacrylic acid or an alkyl ester thereof, itaconic acid, maleic anhydride or vinylidene chloride. In Formula I X may represent, for example, -COOCH 2 CH 2 -, -CONHCH 2 CH 2 - -COSCH 2 CH 2 -, -CONH-, -CH 2 -, -C 6 H 4 SO 2 NH-, -C 6 H 4 SO 2 O-C 6 H 4 - or -CONH-C 6 H 4 . Suitable as photoactivators (a) are compounds of the formula R1CX 2 R2, R4-SO-CX 2 R2, R4-SO 2 -CX 2 R2 or where R1 is H, alkyl, hydroxyalkyl, aryl, halogen or a heterocyclic ring, R2 is H or halogen, R3 is nitro, halogen or alkyl, R4 is alkyl, haloalkyl, aryl or a heterocyclic ring, and X is Cl or Br. The compositions can be colour sensitized by including therein an acridine dye, a merocyanine dye or a styryl dye. The preparations are described of (i) poly- (2 - N - ethyl - N - phenylaminoethyl methacrylate) and (ii) a copolymer of N-(2-N-ethyl- N-phenylaminoethyl)-methacrylamide and styrene by polymerizing the corresponding monomer(s) in methyl ethyl ketone using azobisisobutyronitrile as initiator.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US3579343A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US3579343A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US3579343A3</originalsourceid><addsrcrecordid>eNrjZFAI8PAP8Q9yDfYMDtF18w_y9fRzV3D29w3wD_YM8fT3C-ZhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfGhwcam5pbGJsaOxoRVAACy1iHf</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTORESIST-FORMING COMPOSITIONS</title><source>esp@cenet</source><creator>SHOICHIRO HOSHINO ; MOTOO KOGURE</creator><creatorcontrib>SHOICHIRO HOSHINO ; MOTOO KOGURE</creatorcontrib><description>1,223,632. Photocrosslinkable compositions. KONISHIBOKU PHOTO INDUSTRY CO. Ltd. 24 April, 1968 [25 April, 1967], No. 19469/68. Heading C3P. [Also in Division G2] A photoresist-forming (photocrosslinkable) composition comprises (a) a photoactivator containing a polyhalogenated methyl group which is capable of forming a free radical on exposure to light and (b) a polymer consisting of or containing units of the formula wherein A is H or a carboxylic acid or amide group, X is a divalent organic group, R 1 is H or C 1 -C 3 alkyl, R 2 is H, C 1 -C 3 alkyl or a substituted or unsubstituted phenyl group, and each of R 3 and R 4 , which may be the same or different, is H or C 1 -C 3 alkyl, with the proviso that in Formula II R 2 and R 3 , together with the N atom and benzene nucleus may form a heterocyclic ring system, or R 3 and R 4 together with the benzene nucleus may form a naphthalene ring system. Polymer (b) may be a homopolymer or a copolymer additionally containing units of one or more other monomers, e.g. styrene, acrylonitrile, vinyl acetate, acrylic, methacrylic or α- chloroacrylic acid or an alkyl ester thereof, itaconic acid, maleic anhydride or vinylidene chloride. In Formula I X may represent, for example, -COOCH 2 CH 2 -, -CONHCH 2 CH 2 - -COSCH 2 CH 2 -, -CONH-, -CH 2 -, -C 6 H 4 SO 2 NH-, -C 6 H 4 SO 2 O-C 6 H 4 - or -CONH-C 6 H 4 . Suitable as photoactivators (a) are compounds of the formula R1CX 2 R2, R4-SO-CX 2 R2, R4-SO 2 -CX 2 R2 or where R1 is H, alkyl, hydroxyalkyl, aryl, halogen or a heterocyclic ring, R2 is H or halogen, R3 is nitro, halogen or alkyl, R4 is alkyl, haloalkyl, aryl or a heterocyclic ring, and X is Cl or Br. The compositions can be colour sensitized by including therein an acridine dye, a merocyanine dye or a styryl dye. The preparations are described of (i) poly- (2 - N - ethyl - N - phenylaminoethyl methacrylate) and (ii) a copolymer of N-(2-N-ethyl- N-phenylaminoethyl)-methacrylamide and styrene by polymerizing the corresponding monomer(s) in methyl ethyl ketone using azobisisobutyronitrile as initiator.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1971</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19710518&amp;DB=EPODOC&amp;CC=US&amp;NR=3579343A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19710518&amp;DB=EPODOC&amp;CC=US&amp;NR=3579343A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHOICHIRO HOSHINO</creatorcontrib><creatorcontrib>MOTOO KOGURE</creatorcontrib><title>PHOTORESIST-FORMING COMPOSITIONS</title><description>1,223,632. Photocrosslinkable compositions. KONISHIBOKU PHOTO INDUSTRY CO. Ltd. 24 April, 1968 [25 April, 1967], No. 19469/68. Heading C3P. [Also in Division G2] A photoresist-forming (photocrosslinkable) composition comprises (a) a photoactivator containing a polyhalogenated methyl group which is capable of forming a free radical on exposure to light and (b) a polymer consisting of or containing units of the formula wherein A is H or a carboxylic acid or amide group, X is a divalent organic group, R 1 is H or C 1 -C 3 alkyl, R 2 is H, C 1 -C 3 alkyl or a substituted or unsubstituted phenyl group, and each of R 3 and R 4 , which may be the same or different, is H or C 1 -C 3 alkyl, with the proviso that in Formula II R 2 and R 3 , together with the N atom and benzene nucleus may form a heterocyclic ring system, or R 3 and R 4 together with the benzene nucleus may form a naphthalene ring system. Polymer (b) may be a homopolymer or a copolymer additionally containing units of one or more other monomers, e.g. styrene, acrylonitrile, vinyl acetate, acrylic, methacrylic or α- chloroacrylic acid or an alkyl ester thereof, itaconic acid, maleic anhydride or vinylidene chloride. In Formula I X may represent, for example, -COOCH 2 CH 2 -, -CONHCH 2 CH 2 - -COSCH 2 CH 2 -, -CONH-, -CH 2 -, -C 6 H 4 SO 2 NH-, -C 6 H 4 SO 2 O-C 6 H 4 - or -CONH-C 6 H 4 . Suitable as photoactivators (a) are compounds of the formula R1CX 2 R2, R4-SO-CX 2 R2, R4-SO 2 -CX 2 R2 or where R1 is H, alkyl, hydroxyalkyl, aryl, halogen or a heterocyclic ring, R2 is H or halogen, R3 is nitro, halogen or alkyl, R4 is alkyl, haloalkyl, aryl or a heterocyclic ring, and X is Cl or Br. The compositions can be colour sensitized by including therein an acridine dye, a merocyanine dye or a styryl dye. The preparations are described of (i) poly- (2 - N - ethyl - N - phenylaminoethyl methacrylate) and (ii) a copolymer of N-(2-N-ethyl- N-phenylaminoethyl)-methacrylamide and styrene by polymerizing the corresponding monomer(s) in methyl ethyl ketone using azobisisobutyronitrile as initiator.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1971</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAI8PAP8Q9yDfYMDtF18w_y9fRzV3D29w3wD_YM8fT3C-ZhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfGhwcam5pbGJsaOxoRVAACy1iHf</recordid><startdate>19710518</startdate><enddate>19710518</enddate><creator>SHOICHIRO HOSHINO</creator><creator>MOTOO KOGURE</creator><scope>EVB</scope></search><sort><creationdate>19710518</creationdate><title>PHOTORESIST-FORMING COMPOSITIONS</title><author>SHOICHIRO HOSHINO ; MOTOO KOGURE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US3579343A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1971</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>SHOICHIRO HOSHINO</creatorcontrib><creatorcontrib>MOTOO KOGURE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHOICHIRO HOSHINO</au><au>MOTOO KOGURE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTORESIST-FORMING COMPOSITIONS</title><date>1971-05-18</date><risdate>1971</risdate><abstract>1,223,632. Photocrosslinkable compositions. KONISHIBOKU PHOTO INDUSTRY CO. Ltd. 24 April, 1968 [25 April, 1967], No. 19469/68. Heading C3P. [Also in Division G2] A photoresist-forming (photocrosslinkable) composition comprises (a) a photoactivator containing a polyhalogenated methyl group which is capable of forming a free radical on exposure to light and (b) a polymer consisting of or containing units of the formula wherein A is H or a carboxylic acid or amide group, X is a divalent organic group, R 1 is H or C 1 -C 3 alkyl, R 2 is H, C 1 -C 3 alkyl or a substituted or unsubstituted phenyl group, and each of R 3 and R 4 , which may be the same or different, is H or C 1 -C 3 alkyl, with the proviso that in Formula II R 2 and R 3 , together with the N atom and benzene nucleus may form a heterocyclic ring system, or R 3 and R 4 together with the benzene nucleus may form a naphthalene ring system. Polymer (b) may be a homopolymer or a copolymer additionally containing units of one or more other monomers, e.g. styrene, acrylonitrile, vinyl acetate, acrylic, methacrylic or α- chloroacrylic acid or an alkyl ester thereof, itaconic acid, maleic anhydride or vinylidene chloride. In Formula I X may represent, for example, -COOCH 2 CH 2 -, -CONHCH 2 CH 2 - -COSCH 2 CH 2 -, -CONH-, -CH 2 -, -C 6 H 4 SO 2 NH-, -C 6 H 4 SO 2 O-C 6 H 4 - or -CONH-C 6 H 4 . Suitable as photoactivators (a) are compounds of the formula R1CX 2 R2, R4-SO-CX 2 R2, R4-SO 2 -CX 2 R2 or where R1 is H, alkyl, hydroxyalkyl, aryl, halogen or a heterocyclic ring, R2 is H or halogen, R3 is nitro, halogen or alkyl, R4 is alkyl, haloalkyl, aryl or a heterocyclic ring, and X is Cl or Br. The compositions can be colour sensitized by including therein an acridine dye, a merocyanine dye or a styryl dye. The preparations are described of (i) poly- (2 - N - ethyl - N - phenylaminoethyl methacrylate) and (ii) a copolymer of N-(2-N-ethyl- N-phenylaminoethyl)-methacrylamide and styrene by polymerizing the corresponding monomer(s) in methyl ethyl ketone using azobisisobutyronitrile as initiator.</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title PHOTORESIST-FORMING COMPOSITIONS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T22%3A51%3A22IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SHOICHIRO%20HOSHINO&rft.date=1971-05-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS3579343A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true