GAS TREATMENT METHOD AND GAS TREATMENT DEVICE

A gas treatment method of performing a gas treatment on a substrate having a recess includes: disposing the substrate having the recess in a chamber; adjusting a pressure inside the chamber to a predetermined pressure by supplying a pressure adjustment gas into the chamber in an evacuated state to i...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TAKAHASHI, Tetsuro, SATO, Akihiro, SEOK, Changhwan, DEMICHI, Kimihiko, KOBAYASHI, Jun
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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