APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTOR PROCESSING

Disclosed herein are systems and apparatuses for facilitating semiconductor processing operations involving the use of chlorine-containing and ammonia-containing gases. The systems and apparatuses discussed herein may provide enhanced wafer uniformity and/or may reduce the potential for undesirable,...

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Hauptverfasser:	Durbin, Aaron, Streng, Bradley Taylor, Batzer, Rachel E, Iadanza, Christopher Nicholas, Miller, Aaron Blake
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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creator	Durbin, Aaron Streng, Bradley Taylor Batzer, Rachel E Iadanza, Christopher Nicholas Miller, Aaron Blake
description	Disclosed herein are systems and apparatuses for facilitating semiconductor processing operations involving the use of chlorine-containing and ammonia-containing gases. The systems and apparatuses discussed herein may provide enhanced wafer uniformity and/or may reduce the potential for undesirable, and potentially hazardous, reaction byproduct build-up in such systems.
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2024412953A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2024412953A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2024412953A13</originalsourceid><addsrcrecordid>eNrjZPB3DAhwDHIMCQ12DVZw9HNRCI4MDnH1DVZw8w9ScPT19ffzdNR39vDxD_L0c1Vw9nD19QwOCYpUCAYynP39XEKdQ4AKA4L8nV2Dgz393HkYWNMSc4pTeaE0N4Oym2uIs4duakF-fGpxQWJyal5qSXxosJGBkYmJoZGlqbGjoTFxqgBQYzBe</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTOR PROCESSING</title><source>esp@cenet</source><creator>Durbin, Aaron ; Streng, Bradley Taylor ; Batzer, Rachel E ; Iadanza, Christopher Nicholas ; Miller, Aaron Blake</creator><creatorcontrib>Durbin, Aaron ; Streng, Bradley Taylor ; Batzer, Rachel E ; Iadanza, Christopher Nicholas ; Miller, Aaron Blake</creatorcontrib><description>Disclosed herein are systems and apparatuses for facilitating semiconductor processing operations involving the use of chlorine-containing and ammonia-containing gases. The systems and apparatuses discussed herein may provide enhanced wafer uniformity and/or may reduce the potential for undesirable, and potentially hazardous, reaction byproduct build-up in such systems.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241212&DB=EPODOC&CC=US&NR=2024412953A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241212&DB=EPODOC&CC=US&NR=2024412953A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Durbin, Aaron</creatorcontrib><creatorcontrib>Streng, Bradley Taylor</creatorcontrib><creatorcontrib>Batzer, Rachel E</creatorcontrib><creatorcontrib>Iadanza, Christopher Nicholas</creatorcontrib><creatorcontrib>Miller, Aaron Blake</creatorcontrib><title>APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTOR PROCESSING</title><description>Disclosed herein are systems and apparatuses for facilitating semiconductor processing operations involving the use of chlorine-containing and ammonia-containing gases. The systems and apparatuses discussed herein may provide enhanced wafer uniformity and/or may reduce the potential for undesirable, and potentially hazardous, reaction byproduct build-up in such systems.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPB3DAhwDHIMCQ12DVZw9HNRCI4MDnH1DVZw8w9ScPT19ffzdNR39vDxD_L0c1Vw9nD19QwOCYpUCAYynP39XEKdQ4AKA4L8nV2Dgz393HkYWNMSc4pTeaE0N4Oym2uIs4duakF-fGpxQWJyal5qSXxosJGBkYmJoZGlqbGjoTFxqgBQYzBe</recordid><startdate>20241212</startdate><enddate>20241212</enddate><creator>Durbin, Aaron</creator><creator>Streng, Bradley Taylor</creator><creator>Batzer, Rachel E</creator><creator>Iadanza, Christopher Nicholas</creator><creator>Miller, Aaron Blake</creator><scope>EVB</scope></search><sort><creationdate>20241212</creationdate><title>APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTOR PROCESSING</title><author>Durbin, Aaron ; Streng, Bradley Taylor ; Batzer, Rachel E ; Iadanza, Christopher Nicholas ; Miller, Aaron Blake</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2024412953A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>Durbin, Aaron</creatorcontrib><creatorcontrib>Streng, Bradley Taylor</creatorcontrib><creatorcontrib>Batzer, Rachel E</creatorcontrib><creatorcontrib>Iadanza, Christopher Nicholas</creatorcontrib><creatorcontrib>Miller, Aaron Blake</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Durbin, Aaron</au><au>Streng, Bradley Taylor</au><au>Batzer, Rachel E</au><au>Iadanza, Christopher Nicholas</au><au>Miller, Aaron Blake</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTOR PROCESSING</title><date>2024-12-12</date><risdate>2024</risdate><abstract>Disclosed herein are systems and apparatuses for facilitating semiconductor processing operations involving the use of chlorine-containing and ammonia-containing gases. The systems and apparatuses discussed herein may provide enhanced wafer uniformity and/or may reduce the potential for undesirable, and potentially hazardous, reaction byproduct build-up in such systems.</abstract><oa>free_for_read</oa></addata></record>
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subjects	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
title	APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTOR PROCESSING
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T17%3A01%3A58IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Durbin,%20Aaron&rft.date=2024-12-12&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2024412953A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true