SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME

Embodiments of a substrate processing apparatus and substrate processing method are provided. Embodiments include a laser that directs a laser beam toward a substrate. Embodiments further include a chuck spaced apart in a first direction from the laser. Embodiments include a lower particle blocker d...

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Bibliographische Detailangaben
Hauptverfasser: Hong, Seongpyo, Lee, Sang Min, Koo, Namil, Bae, Sangwoo
Format: Patent
Sprache:eng
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