PROCESSING APPARATUS, PROCESSING METHOD, AND MANUFACTURING METHOD OF SUBSTRATE

The present disclosure provides a processing apparatus that forms protrusions and recesses on a substrate surface by ablation processing using a laser beam.

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Ohtani, Yoshikazu, Yamaoka, Hiroshi, Kurata, Masami, Usami, Taketo
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The present disclosure provides a processing apparatus that forms protrusions and recesses on a substrate surface by ablation processing using a laser beam.