TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRATE SUPPORT FOR MULTI-PATTERNING PROCESSES
A substrate processing system is provided and includes a substrate support, a memory, and calibration, operating parameter, and solving modules. The substrate support supports a substrate and includes temperature control elements. The memory stores, for the temperature control elements, temperature...
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| creator | CHANDRASEKHARAN, Ramesh LAVOIE, Adrien ROBERTS, Michael Philip AGARWAL, Pulkit SOE, Chan Myae Myae SAURABH, Ashish KUMAR, Ravi YANG, Nuoya |
| description | A substrate processing system is provided and includes a substrate support, a memory, and calibration, operating parameter, and solving modules. The substrate support supports a substrate and includes temperature control elements. The memory stores, for the temperature control elements, temperature calibration values and sensitivity calibration values. The calibration module, during calibration of the temperature control elements, performs a first calibration process to determine the temperature calibration values or a second calibration process to determine the sensitivity calibration values. The sensitivity calibration values relate at least one of trim amounts or deposition amounts to temperature changes. The operating parameter module determines operating parameters for the temperature control elements based on the temperature and sensitivity calibration values. The solving module, subsequent to the calibration of the temperature control elements, controls operation of the temperature control elements during at least one of a trim or deposition step based on the operating parameters. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2024392443A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2024392443A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2024392443A13</originalsourceid><addsrcrecordid>eNqNjMEKgkAQQL10iOofBjoLpV46bjrmgO4ssyNCF5HYLkUJ9v9k4Ad0eu_weOvooUINGFtAgY49KbEFJ1xSjZCzVeEaOtIKmrZWiq9sESo0igX49uxVZp3NORaFkmXpnFFFsWQvv1uO3qPfRqv78JzCbuEm2peoeRWH8d2HaRxu4RU-feuTQ5KlpyTLUnNM_6u-Ay84Lg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRATE SUPPORT FOR MULTI-PATTERNING PROCESSES</title><source>esp@cenet</source><creator>CHANDRASEKHARAN, Ramesh ; LAVOIE, Adrien ; ROBERTS, Michael Philip ; AGARWAL, Pulkit ; SOE, Chan Myae Myae ; SAURABH, Ashish ; KUMAR, Ravi ; YANG, Nuoya</creator><creatorcontrib>CHANDRASEKHARAN, Ramesh ; LAVOIE, Adrien ; ROBERTS, Michael Philip ; AGARWAL, Pulkit ; SOE, Chan Myae Myae ; SAURABH, Ashish ; KUMAR, Ravi ; YANG, Nuoya</creatorcontrib><description>A substrate processing system is provided and includes a substrate support, a memory, and calibration, operating parameter, and solving modules. The substrate support supports a substrate and includes temperature control elements. The memory stores, for the temperature control elements, temperature calibration values and sensitivity calibration values. The calibration module, during calibration of the temperature control elements, performs a first calibration process to determine the temperature calibration values or a second calibration process to determine the sensitivity calibration values. The sensitivity calibration values relate at least one of trim amounts or deposition amounts to temperature changes. The operating parameter module determines operating parameters for the temperature control elements based on the temperature and sensitivity calibration values. The solving module, subsequent to the calibration of the temperature control elements, controls operation of the temperature control elements during at least one of a trim or deposition step based on the operating parameters.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; PHYSICS ; REGULATING ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241128&DB=EPODOC&CC=US&NR=2024392443A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241128&DB=EPODOC&CC=US&NR=2024392443A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHANDRASEKHARAN, Ramesh</creatorcontrib><creatorcontrib>LAVOIE, Adrien</creatorcontrib><creatorcontrib>ROBERTS, Michael Philip</creatorcontrib><creatorcontrib>AGARWAL, Pulkit</creatorcontrib><creatorcontrib>SOE, Chan Myae Myae</creatorcontrib><creatorcontrib>SAURABH, Ashish</creatorcontrib><creatorcontrib>KUMAR, Ravi</creatorcontrib><creatorcontrib>YANG, Nuoya</creatorcontrib><title>TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRATE SUPPORT FOR MULTI-PATTERNING PROCESSES</title><description>A substrate processing system is provided and includes a substrate support, a memory, and calibration, operating parameter, and solving modules. The substrate support supports a substrate and includes temperature control elements. The memory stores, for the temperature control elements, temperature calibration values and sensitivity calibration values. The calibration module, during calibration of the temperature control elements, performs a first calibration process to determine the temperature calibration values or a second calibration process to determine the sensitivity calibration values. The sensitivity calibration values relate at least one of trim amounts or deposition amounts to temperature changes. The operating parameter module determines operating parameters for the temperature control elements based on the temperature and sensitivity calibration values. The solving module, subsequent to the calibration of the temperature control elements, controls operation of the temperature control elements during at least one of a trim or deposition step based on the operating parameters.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>PHYSICS</subject><subject>REGULATING</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjMEKgkAQQL10iOofBjoLpV46bjrmgO4ssyNCF5HYLkUJ9v9k4Ad0eu_weOvooUINGFtAgY49KbEFJ1xSjZCzVeEaOtIKmrZWiq9sESo0igX49uxVZp3NORaFkmXpnFFFsWQvv1uO3qPfRqv78JzCbuEm2peoeRWH8d2HaRxu4RU-feuTQ5KlpyTLUnNM_6u-Ay84Lg</recordid><startdate>20241128</startdate><enddate>20241128</enddate><creator>CHANDRASEKHARAN, Ramesh</creator><creator>LAVOIE, Adrien</creator><creator>ROBERTS, Michael Philip</creator><creator>AGARWAL, Pulkit</creator><creator>SOE, Chan Myae Myae</creator><creator>SAURABH, Ashish</creator><creator>KUMAR, Ravi</creator><creator>YANG, Nuoya</creator><scope>EVB</scope></search><sort><creationdate>20241128</creationdate><title>TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRATE SUPPORT FOR MULTI-PATTERNING PROCESSES</title><author>CHANDRASEKHARAN, Ramesh ; LAVOIE, Adrien ; ROBERTS, Michael Philip ; AGARWAL, Pulkit ; SOE, Chan Myae Myae ; SAURABH, Ashish ; KUMAR, Ravi ; YANG, Nuoya</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2024392443A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>PHYSICS</topic><topic>REGULATING</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>CHANDRASEKHARAN, Ramesh</creatorcontrib><creatorcontrib>LAVOIE, Adrien</creatorcontrib><creatorcontrib>ROBERTS, Michael Philip</creatorcontrib><creatorcontrib>AGARWAL, Pulkit</creatorcontrib><creatorcontrib>SOE, Chan Myae Myae</creatorcontrib><creatorcontrib>SAURABH, Ashish</creatorcontrib><creatorcontrib>KUMAR, Ravi</creatorcontrib><creatorcontrib>YANG, Nuoya</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHANDRASEKHARAN, Ramesh</au><au>LAVOIE, Adrien</au><au>ROBERTS, Michael Philip</au><au>AGARWAL, Pulkit</au><au>SOE, Chan Myae Myae</au><au>SAURABH, Ashish</au><au>KUMAR, Ravi</au><au>YANG, Nuoya</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRATE SUPPORT FOR MULTI-PATTERNING PROCESSES</title><date>2024-11-28</date><risdate>2024</risdate><abstract>A substrate processing system is provided and includes a substrate support, a memory, and calibration, operating parameter, and solving modules. The substrate support supports a substrate and includes temperature control elements. The memory stores, for the temperature control elements, temperature calibration values and sensitivity calibration values. The calibration module, during calibration of the temperature control elements, performs a first calibration process to determine the temperature calibration values or a second calibration process to determine the sensitivity calibration values. The sensitivity calibration values relate at least one of trim amounts or deposition amounts to temperature changes. The operating parameter module determines operating parameters for the temperature control elements based on the temperature and sensitivity calibration values. The solving module, subsequent to the calibration of the temperature control elements, controls operation of the temperature control elements during at least one of a trim or deposition step based on the operating parameters.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING DIFFUSION TREATMENT OF METALLIC MATERIAL FUNCTIONAL ELEMENTS OF SUCH SYSTEMS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRATE SUPPORT FOR MULTI-PATTERNING PROCESSES |
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