SEMICONDUCTOR DEVICE AND METHOD

An embodiment includes a semiconductor device, a plurality of fin structures extending from a substrate, the plurality of fin structures having a plurality of first fin structures and a plurality of second fin structures. The semiconductor device also includes a plurality of isolation regions on the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Wu, Hsi-Jung, Lu, Ying-Hsin, Hsiao, Ru-Shang, Yu, Sheng-Fu
Format: Patent
Sprache:eng
Schlagworte:
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