CAPACITOR FORMED WITH HIGH RESISTANCE LAYER AND METHOD OF MANUFACTURING SAME

A method is provided for producing a semiconductor structure including at least one capacitor. The method includes: forming a first metal layer; forming a second metal layer; forming a third high resistance (HiR) layer interposed between the first metal layer and the second metal layer, wherein at l...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Chen, Shiou-Fan, Chang, Mingni, Huang, Hsuan-Ming
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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