METHOD FOR DRYING WAFER

A method for drying a wafer includes a cleaning step, a liquid replacing step, and a drying step. In the cleaning step, a workpiece located in a process chamber is cleaned with a cleaning solution. In the liquid replacing step, a drying agent in gas phase is compressed to convert into liquid phase,...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIN, SHIH-KAI, CHOU, SHENG-YAO, KUO, HUNG-MING, SUN, PEI-JUN, WANG, YU-BO, CHANG, TINGANG, KUO, CHUAN-WEI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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