INTERCONNECT STRUCTURE INCLUDING GRAPHITE AND METHOD FORMING SAME

A method includes forming a first conductive feature, depositing a graphite layer over the first conductive feature, patterning the graphite layer to form a graphite conductive feature, depositing a dielectric spacer layer on the graphite layer, depositing a first dielectric layer over the dielectri...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Lin, Chi-Feng, Chi, Chih-Chien, Chang, Chih-Yi, Su, Hung-Wen, Chin, Shu-Cheng, Chan, Wei Hsiang
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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