ELECTROSTATIC CHUCK
According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a bonding layer provided between the ceramic dielectric substrate and the base plate. At least one of the following first to sixth conditions is satisfied: First condition: An elongation pe...
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| creator | SASAKI, Hitoshi MOMIYAMA, Yutaka |
| description | According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a bonding layer provided between the ceramic dielectric substrate and the base plate. At least one of the following first to sixth conditions is satisfied: First condition: An elongation percentage α1 is not less than 120%; Second condition: A ratio α1/α2 of the elongation percentage is not less than 0.60; Third condition: A bonding strength β1 is not less than 0.4 MPa and not more than 10 MPa; Fourth condition: A ratio β1/β2 of the bonding strength is not less than 0.6 and not more than 10; Fifth condition: An elastic modulus γ1 is not less than 0.1 MPa and not more than 10 MPa; Sixth condition: A ratio γ1/γ2 of the elastic modulus is not less than 0.6 and not more than 30. |
| format | Patent |
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At least one of the following first to sixth conditions is satisfied: First condition: An elongation percentage α1 is not less than 120%; Second condition: A ratio α1/α2 of the elongation percentage is not less than 0.60; Third condition: A bonding strength β1 is not less than 0.4 MPa and not more than 10 MPa; Fourth condition: A ratio β1/β2 of the bonding strength is not less than 0.6 and not more than 10; Fifth condition: An elastic modulus γ1 is not less than 0.1 MPa and not more than 10 MPa; Sixth condition: A ratio γ1/γ2 of the elastic modulus is not less than 0.6 and not more than 30.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; METALLURGY ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241010&DB=EPODOC&CC=US&NR=2024339351A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241010&DB=EPODOC&CC=US&NR=2024339351A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SASAKI, Hitoshi</creatorcontrib><creatorcontrib>MOMIYAMA, Yutaka</creatorcontrib><title>ELECTROSTATIC CHUCK</title><description>According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a bonding layer provided between the ceramic dielectric substrate and the base plate. At least one of the following first to sixth conditions is satisfied: First condition: An elongation percentage α1 is not less than 120%; Second condition: A ratio α1/α2 of the elongation percentage is not less than 0.60; Third condition: A bonding strength β1 is not less than 0.4 MPa and not more than 10 MPa; Fourth condition: A ratio β1/β2 of the bonding strength is not less than 0.6 and not more than 10; Fifth condition: An elastic modulus γ1 is not less than 0.1 MPa and not more than 10 MPa; Sixth condition: A ratio γ1/γ2 of the elastic modulus is not less than 0.6 and not more than 30.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB29XF1DgnyDw5xDPF0VnD2CHX25mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgZGJsbGlsamho6GxsSpAgDbkR9S</recordid><startdate>20241010</startdate><enddate>20241010</enddate><creator>SASAKI, Hitoshi</creator><creator>MOMIYAMA, Yutaka</creator><scope>EVB</scope></search><sort><creationdate>20241010</creationdate><title>ELECTROSTATIC CHUCK</title><author>SASAKI, Hitoshi ; MOMIYAMA, Yutaka</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2024339351A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SASAKI, Hitoshi</creatorcontrib><creatorcontrib>MOMIYAMA, Yutaka</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SASAKI, Hitoshi</au><au>MOMIYAMA, Yutaka</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTROSTATIC CHUCK</title><date>2024-10-10</date><risdate>2024</risdate><abstract>According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a bonding layer provided between the ceramic dielectric substrate and the base plate. At least one of the following first to sixth conditions is satisfied: First condition: An elongation percentage α1 is not less than 120%; Second condition: A ratio α1/α2 of the elongation percentage is not less than 0.60; Third condition: A bonding strength β1 is not less than 0.4 MPa and not more than 10 MPa; Fourth condition: A ratio β1/β2 of the bonding strength is not less than 0.6 and not more than 10; Fifth condition: An elastic modulus γ1 is not less than 0.1 MPa and not more than 10 MPa; Sixth condition: A ratio γ1/γ2 of the elastic modulus is not less than 0.6 and not more than 30.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
| title | ELECTROSTATIC CHUCK |
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