METHOD OF MANUFACTURING SILICON WAFERS

To provide a method of manufacturing silicon wafers having a low oxygen concentration and being provided with the gettering capability of heavy metals even when the density of BMD is low. The method includes a step of placing wafers sliced from a silicon single crystal and having an oxygen concentra...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MATSUMURA, Hisashi, SUDO, Haruo, MAEDA, Susumu
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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