MACHINE LEARNING MODEL FOR SEMICONDUCTOR MANUFACTURING PROCESSES

The disclosure describes methods and systems for training and deploying a machine learning predictive model for use in a semiconductor manufacturing process. Specifically, the present disclosure provides for training machine learning predictive models for manufacturing components using design data,...

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Bibliographische Detailangaben
Hauptverfasser: LOH, Joanna Kejun, HUANG, Zhiqiang, LINDLEY, Roger Alan, TAN, Li Ming, KOENTJORO, Olivia Fatma
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The disclosure describes methods and systems for training and deploying a machine learning predictive model for use in a semiconductor manufacturing process. Specifically, the present disclosure provides for training machine learning predictive models for manufacturing components using design data, process parameters, gas flow configurations from a pixelated showerhead, temperature profile across an electrostatic chuck, and measured uniformity profiles of processed wafers. The present disclosure also provides for deploying the machine learning predictive model to effectuate real-time adjustments to a manufacturing process.