SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME

An interconnection structure, along with methods of forming such, are described. The structure includes a dielectric layer, a first conductive feature disposed in the dielectric layer, and a conductive layer disposed over the dielectric layer. The conductive layer includes a first portion and a seco...

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Bibliographische Detailangaben
Hauptverfasser: TENG, Chi-Lin, SHUE, Shau-Lin, CHANG, Hsiaokang, HUANG, Hsin-Yen, LEE, Shao-Kuan, LO, Ting-Ya, LEE, Cheng-Chin
Format: Patent
Sprache:eng
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