ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES
The system includes a light source configured to emit light at one or more wavelengths, one or more angles of incidence (AOI), and one or more azimuths; a polarization assembly configured to produce one or more polarization states of the light; a main objective configured to focus the light in the o...
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| creator | Wang, David Y Peterlinz, Kevin |
| description | The system includes a light source configured to emit light at one or more wavelengths, one or more angles of incidence (AOI), and one or more azimuths; a polarization assembly configured to produce one or more polarization states of the light; a main objective configured to focus the light in the one or more polarization states onto a target that reflects the light; an analyzer assembly configured to analyze one or more polarization states of the light reflected from the target; a detector configured to detect the light reflected from the target and generate an output signal based on the detected light; and a processor configured to generate a measurement of the target based on the output signal produced at the one or more polarization states, the one or more wavelengths, the one or more AOIs, and the one or more azimuths. |
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a polarization assembly configured to produce one or more polarization states of the light; a main objective configured to focus the light in the one or more polarization states onto a target that reflects the light; an analyzer assembly configured to analyze one or more polarization states of the light reflected from the target; a detector configured to detect the light reflected from the target and generate an output signal based on the detected light; and a processor configured to generate a measurement of the target based on the output signal produced at the one or more polarization states, the one or more wavelengths, the one or more AOIs, and the one or more azimuths.</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPB19HP3cVUIcg329wlzdQEy3HxcnUP8fV1DgiIV3PyDFEI8PJ29Fdw8fXyDFRz9XBQ8PN09FByDA4CqFIIcQzz9FYJDgkKdQ0KBZvAwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvjQYCMDIxMjCwMTCxNHQ2PiVAEAqmsvRw</recordid><startdate>20240822</startdate><enddate>20240822</enddate><creator>Wang, David Y</creator><creator>Peterlinz, Kevin</creator><scope>EVB</scope></search><sort><creationdate>20240822</creationdate><title>ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES</title><author>Wang, David Y ; 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a polarization assembly configured to produce one or more polarization states of the light; a main objective configured to focus the light in the one or more polarization states onto a target that reflects the light; an analyzer assembly configured to analyze one or more polarization states of the light reflected from the target; a detector configured to detect the light reflected from the target and generate an output signal based on the detected light; and a processor configured to generate a measurement of the target based on the output signal produced at the one or more polarization states, the one or more wavelengths, the one or more AOIs, and the one or more azimuths.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING |
| title | ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES |
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