MICROELECTRONIC DEVICES WITH CONDUCTIVE EXTENSIONS BETWEEN UPPER STAIRCASE STEPS AND THEIR CONTACTS, AND RELATED METHODS

Methods for forming microelectronic devices include forming a staircase structure in a stack structure having a vertically alternating sequence of insulative and conductive materials arranged in tiers. Steps are at lateral ends of the tiers. Contact openings of different aspect ratios are formed in...

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Bibliographische Detailangaben
Hauptverfasser: Ong, Biow Hiem, Chen, Chii Wean Calvin, Emor, Christian George, Lo, Wing Yu, Quek, Chieh Hsien, Daycock, David A
Format: Patent
Sprache:eng
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