SEMICONDUCTOR DEVICE HAVING DEVICE ELEMENT STRUCTURES WITH PN JUNCTION FORMED IN ACTIVE REGION AND VOLTAGE WITHSTANDING RINGS FORMED IN PERIPHERY REGION SURROUNDING THE ACTIVE REGION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

A semiconductor substrate is fabricated in which only first and second n−-type epitaxial layers are stacked on an n+-type starting substrate, a front surface of the substrate being a continuously flat surface from an active region to a chip end. In an edge termination region, as a voltage withstandi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: HOSHI, Yasuyuki
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!