DISPLAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE

DISPLAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE

A display substrate, manufacturing method thereof, and a display device. The display substrate includes a base substrate and a semiconductor layer and a conductive layer on the base substrate. The semiconductor layer includes a channel region and a doped region pattern of a transistor; the conductiv...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LI, Zengrong, LIN, Zengjie, LI, Liangliang, CHEN, Zhouyu, CHEN, Xiaolong, FU, Wanxia, LIN, Bin
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:A display substrate, manufacturing method thereof, and a display device. The display substrate includes a base substrate and a semiconductor layer and a conductive layer on the base substrate. The semiconductor layer includes a channel region and a doped region pattern of a transistor; the conductive layer includes a data line, and a first electrode and a second electrode of the transistor. An extension direction of an overlapping portion of the semiconductor layer with the data line is the same as an extension direction of the data line, and the semiconductor layer includes a first protrusion portion, and a size of an interval between an edge of the first protrusion portion away from the data line and the edge of the data line is greater than 0 and smaller than 3.0 microns.