LASER PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

A laser processing apparatus includes a stage having a wafer holding surface, a laser irradiation mechanism, and a nozzle. On the wafer holding surface, a semiconductor wafer having a first surface and a second surface opposite to the first surface is disposed such that the wafer holding surface fac...

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Bibliographische Detailangaben
Hauptverfasser: MATSUMURA, Tamio, KAMOSHIDA, Ryo
Format: Patent
Sprache:eng
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