HEAT TREATMENT CHAMBER, FILM FORMING APPARATUS, AND SUBSTRATE HEATING METHOD

A heat treatment chamber for performing a heat treatment on a substrate, includes a chamber housing surrounding the substrate, a light transmitting window forming a part of the chamber housing, and an LED light source, provided on an outer side of the chamber housing, and configured to irradiate lig...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: OHASHI, Haruhisa, INOUE, Takahiro, KUROKAWA, Gohei
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!