HEAT TREATMENT CHAMBER, FILM FORMING APPARATUS, AND SUBSTRATE HEATING METHOD

HEAT TREATMENT CHAMBER, FILM FORMING APPARATUS, AND SUBSTRATE HEATING METHOD

A heat treatment chamber for performing a heat treatment on a substrate, includes a chamber housing surrounding the substrate, a light transmitting window forming a part of the chamber housing, and an LED light source, provided on an outer side of the chamber housing, and configured to irradiate lig...

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Hauptverfasser: OHASHI, Haruhisa, INOUE, Takahiro, KUROKAWA, Gohei
Format: Patent
Sprache:eng
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ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
PHYSICS
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creator OHASHI, Haruhisa
INOUE, Takahiro
KUROKAWA, Gohei
description A heat treatment chamber for performing a heat treatment on a substrate, includes a chamber housing surrounding the substrate, a light transmitting window forming a part of the chamber housing, and an LED light source, provided on an outer side of the chamber housing, and configured to irradiate light on the substrate arranged inside the chamber housing through the light transmitting window, so to perform the heat treatment on the substrate.
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subjects ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
PHYSICS
title HEAT TREATMENT CHAMBER, FILM FORMING APPARATUS, AND SUBSTRATE HEATING METHOD
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