PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD

Provided is a plasma control method including applying gas to a chamber having a wafer loaded therein, generating plasma by applying both radio frequency (RF) power associated with a first voltage at a first frequency and a second voltage at a second frequency that is lower than the first frequency...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HUR, Minyoung, KIM, Jihwan, KIM, Namkyun, KIM, Kyungsun, KIM, Yirop, KIM, Changho, KANG, Hyeongmo, KO, Illsang, SHIM, Seungbo, GWAK, Dooyoung
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!