FINFET CIRCUIT DEVICES WITH WELL ISOLATION

A method includes receiving a structure that includes a substrate including a first well region having a first dopant type and a second well region having a second dopant type that is opposite to the first dopant type; and fins extending above the substrate. The method further includes forming a pat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Yang, Chang-Ta, Yang, Chih-Chuan
Format: Patent
Sprache:eng
Schlagworte:
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