APPARATUS FOR TREATING SUBSTRATE

APPARATUS FOR TREATING SUBSTRATE

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes an ion blocker dividing the inner space into a first space at a bottom side and a second space at a top side; a support unit configured to support a substrate at the first space; and a plasma sou...

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Hauptverfasser: BONG, Youn Gun, LEE, Sang Jeong, KIM, Yun Sang, KANG, Han Lim, CHOI, Yoon Seok, JO, Hyun Woo
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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creator BONG, Youn Gun
LEE, Sang Jeong
KIM, Yun Sang
KANG, Han Lim
CHOI, Yoon Seok
JO, Hyun Woo
description The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes an ion blocker dividing the inner space into a first space at a bottom side and a second space at a top side; a support unit configured to support a substrate at the first space; and a plasma source generating a plasma at the inner space, and wherein a plurality of passages are formed at the ion blocker for flowing a fluid from the second space to the first space, and the ion blocker is made of a dielectric substance, and an ion among an ion and a radical included in the plasma is captured while passing through the passage.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title APPARATUS FOR TREATING SUBSTRATE
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