MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL

A multi-beam particle microscope can provide improved beam current control. Excess electrons discharged from one or just a few regions of an absorber layer provided on a multi-aperture array can be measured via an ammeter. The measured currents can be used as controlled variables in a closed loop co...

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Hauptverfasser: Kierey, Holger, Storeck, Gero
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Storeck, Gero
description A multi-beam particle microscope can provide improved beam current control. Excess electrons discharged from one or just a few regions of an absorber layer provided on a multi-aperture array can be measured via an ammeter. The measured currents can be used as controlled variables in a closed loop control. The measurement can be large-area and low-noise. The multi-aperture array can be specifically structured to also realize a direction sensitive detection, for example via a quadrant detector or a tertial detector.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL
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