METROLOGY METHOD AND APPARATUS

Disclosed is a method for measuring a target located on a substrate beneath at least one layer. The method comprises exciting said at least one layer with pump radiation comprising at least one pump wavelength, so as to generate an acoustic wave within said at least one layer which reflects of said...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	DE HAAN, Guido, VAN DEN HOOVEN, Thomas Jan, SETIJA, Irwan Dani, EDWARD, Stephen, PLANKEN, Paulus Clemens Maria
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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