METHOD FOR DETECTING ENVIRONMENTAL PARAMETER IN SEMICONDUCTOR FABRICATION FACILITY

A method of monitoring a semiconductor fabrication facility and a semiconductor fabrication facility are provided. The method includes collecting an ambient air in a clean room through a plurality of gas lines with their gas inlets arranged at a plurality of sampling positions in the clean room. The...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHUANG, TZU-SOU, TSAO, CHIH-MING
Format:	Patent
Sprache:	eng
Schlagworte:	ALARM SYSTEMS INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING ORDER TELEGRAPHS PHYSICS SIGNALLING SIGNALLING OR CALLING SYSTEMS TESTING
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