LIQUID SUPPLY UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING SAME

Proposed is a substrate treating apparatus. The substrate treating apparatus includes a treating container having a treating space therein, a support unit supporting and rotate a substrate in the treating space, and a liquid supply unit supplying a treating liquid onto the substrate, wherein the liquid supply unit may include a nozzle member and an actuator for moving the nozzle member, wherein the nozzle member may include nozzles arranged along a first direction so that the nozzles form a first row and nozzles coupled to the body and arranged along the first direction so that the nozzles form a second row, wherein the first row and the second row may be spaced apart from each other in a second direction perpendicular to the first direction when viewed from above. At this time, the nozzles constituting the nozzle member may be observed as a whole from the front.