MULTIPROCESS SUBSTRATE TREATMENT FOR ENHANCED SUBSTRATE DOPING

A method of doping a substrate may include exposing a substrate surface of the semiconductor substrate to a plasma clean, performing a deposition of a dopant layer on the substrate surface using a plasma source, after the plasma clean, the dopant layer comprising a dopant element; and exposing the s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Olson, Joseph C, Hatem, Christopher R, Seebauer, Edmund G, Kennedy, Michael Noel
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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