SELECTIVE THIN FILM FORMATION METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

A selective thin film formation method, comprising forming a structure on a substrate in which a first material film including silicon atoms and oxygen atoms and a second material film different from the first material film are exposed, selectively forming an inhibitor liner only on an exposed surfa...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHO, Younjoung, HWANG, Byungkeun, HWANG, Sunhye, LIM, Hyeonggeun
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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