METHODS AND APPARATUS FOR COOLING A SUBSTRATE SUPPORT

Methods and apparatus for processing a substrate are provided herein. For example, an apparatus for processing a substrate comprises a process chamber configured to process a substrate, a substrate support comprising a heat sink configured to cool the substrate support during operation and a water t...

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Bibliographische Detailangaben
Hauptverfasser: KINTNER, Shane Lawrence, DECOTTIGNIES, Robert Irwin, FISH, Roger Bradford, SZUDARSKI, Steven
Format: Patent
Sprache:eng
Schlagworte:
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