INTERCONNECT STRUCTURE WITH INCREASED DECOUPLING CAPACITANCE

A semiconductor chip device includes a substrate with a first dielectric material of a first permittivity value. A power input line and ground line are positioned in the substrate and arranged to form a decoupling capacitor. A region of the substrate in between the power input line and the ground li...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Clevenger, Lawrence A, Chu, Albert M, Lanzillo, Nicholas Anthony
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!