ETCHING CONTROL SYSTEM AND ETCHING CONTROL METHOD

An etching control system includes a prediction device and an etching control device. The prediction device includes a calculator configured to calculate, by using a model indicating a relationship between distribution of an etching amount within a surface of a substrate and a process parameter, whi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Tsuruda, Toyohisa, Lee, Suguen, Marumoto, Hiroshi, Enomoto, Masashi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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