SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

According to the present disclosure, there is provided a technique capable of suppressing an erroneous detection of a presence or absence of a substrate caused by a light receiver receiving a specularly reflected light. There is provided a technique that includes: a holding structure provided with a...

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Hauptverfasser: Hara, Naoki, Amano, Tomihiro, Hiyama, Shin
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creator Hara, Naoki
Amano, Tomihiro
Hiyama, Shin
description According to the present disclosure, there is provided a technique capable of suppressing an erroneous detection of a presence or absence of a substrate caused by a light receiver receiving a specularly reflected light. There is provided a technique that includes: a holding structure provided with a placing surface capable of accommodating a substrate thereon; a light detector including: a light emitter arranged to irradiate an irradiation light toward a back surface of the substrate placed on the placing surface; and a light receiver arranged to be capable of receiving a diffusely reflected light of the irradiation light irradiated from the light emitter without receiving a specularly reflected light of the irradiation light; and a controller configured to be capable of determining a presence or absence of the substrate based on a light receiving state of the light receiver.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
title SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
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