GUIDING DEVICE AND ASSOCIATED SYSTEM
An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region...
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| creator | LOGINOV, Maksim DUARTE RODRIGUES NUNES, Rui Miguel TEGENBOSCH, Henricus Gerardus LABETSKI, Dzmitry HUMMLER, Klaus Martin MOJAB, Seyedmohammad STEWART, John Tom SHATALOV, Alexander JOHNKADAKSHAM, Arun LAFORGE, Andrew David FEENSTRA, Kornelis Frits BERENDSEN, Christianus Wilhelmus Johannes ERSHOV, Alexander Igorevich XIA, Chunguang FOMENKOV, Igor Vladimirovich NADIR, Kerim KRAUSHAAR, Matthias LANGLOIS, Marc Guy MA, Yue |
| description | An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector. |
| format | Patent |
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an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE |
| title | GUIDING DEVICE AND ASSOCIATED SYSTEM |
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