METHOD OF FABRICATING SEMICONDUCTOR DEVICE

A method of fabricating a semiconductor device may use, as an internal contact region, a region in which a memory cell region overlaps a core and/or peripheral region by bonding at least a partial region of the memory cell region to at least a partial region of the core and/or peripheral region by a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Choi, Hyungeun, Lee, Kiseok
Format: Patent
Sprache:eng
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