PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

A plasma processing apparatus comprises a chamber, a substrate support, a plasma generator, a bias power supply and a chuck power supply. The substrate support includes a base and a dielectric part. The base includes a base member and an electrode. The base member is made of a dielectric or an insul...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KOSHIMIZU, Chishio
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
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