SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIFORM HEAT OUTPUT

An arrangement of linear heat lamps is provided which allows for localized control of temperature nonuniformities in a substrate during semiconductor processing. A reactor includes a substrate holder positioned between a top array and a bottom array of linear heat lamps. At least one lamp of the arr...

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Hauptverfasser: Kim, Sam, Rajavelu Muralidhar, Shiva K.T
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Rajavelu Muralidhar, Shiva K.T
description An arrangement of linear heat lamps is provided which allows for localized control of temperature nonuniformities in a substrate during semiconductor processing. A reactor includes a substrate holder positioned between a top array and a bottom array of linear heat lamps. At least one lamp of the arrays includes a filament having a varying density and power output along the length of the lamp. In particular, at least one lamp of the arrays includes a filament having a higher filament winding density within a central portion of the lamp relative to peripheral portions of the lamp. In some embodiments, the at least one lamp is a central lamp extending across a central portion of the substrate heated by the lamp. Furthermore, at least one lamp of the arrays has a higher power output within a central portion of the lamp than at peripheral portions of the lamp.
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subjects BASIC ELECTRIC ELEMENTS
BLASTING
ELECTRIC HEATING
ELECTRIC INCANDESCENT LAMPS
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FURNACES
FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL
HEATING
KILNS
LIGHTING
MECHANICAL ENGINEERING
OPEN SINTERING OR LIKE APPARATUS
OVENS
RETORTS
SEMICONDUCTOR DEVICES
WEAPONS
title SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIFORM HEAT OUTPUT
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