FOCUS RING AND PLASMA ETCHING APPARATUS COMPRISING THE SAME

A plasma etching apparatus includes a chamber configured to generate plasma, an electrostatic chuck disposed in the chamber, and a focus ring placed on the electrostatic chuck and configured to support an object to be etched. The focus ring includes a seating part and a body part. A seating surface...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM, Kyungin, CHAE, Su Man, MIN, Kyungyeol, HWANG, SungSic, CHOI, Yongsoo, KANG, Jungkun
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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