EVAPORATION SYSTEM HAVING IMPROVED COLLIMATION
A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a three-point plurality of point evaporation sources disposed adjac...
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creator | CONSIDINE, Timothy SZIKLAS, Laurie KHAYRULLIN, Ilyas I LIN, Howard BRAUN, Tim FRAYER, Maxim TICE, Kerry GHOSH, Amalkumar P VAZAN, Fridrich ZHAO, Fangchao |
description | A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a three-point plurality of point evaporation sources disposed adjacent to the central axis of the substrate and at a distance from the substrate whereby the nozzle assembly provides for molecules of evaporated material to arrive at the substrate at an incident angle of less than or equal to 5 degrees. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2024042482A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2024042482A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2024042482A13</originalsourceid><addsrcrecordid>eNrjZNBzDXMM8A9yDPH091MIjgwOcfVV8HAM8_RzV_D0DQjyD3N1UXD29_Hx9AUr4WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgZGJgYmRiYWRo6GxsSpAgCpgicM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EVAPORATION SYSTEM HAVING IMPROVED COLLIMATION</title><source>esp@cenet</source><creator>CONSIDINE, Timothy ; SZIKLAS, Laurie ; KHAYRULLIN, Ilyas I ; LIN, Howard ; BRAUN, Tim ; FRAYER, Maxim ; TICE, Kerry ; GHOSH, Amalkumar P ; VAZAN, Fridrich ; ZHAO, Fangchao</creator><creatorcontrib>CONSIDINE, Timothy ; SZIKLAS, Laurie ; KHAYRULLIN, Ilyas I ; LIN, Howard ; BRAUN, Tim ; FRAYER, Maxim ; TICE, Kerry ; GHOSH, Amalkumar P ; VAZAN, Fridrich ; ZHAO, Fangchao</creatorcontrib><description>A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a three-point plurality of point evaporation sources disposed adjacent to the central axis of the substrate and at a distance from the substrate whereby the nozzle assembly provides for molecules of evaporated material to arrive at the substrate at an incident angle of less than or equal to 5 degrees.</description><language>eng</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; PERFORMING OPERATIONS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240208&DB=EPODOC&CC=US&NR=2024042482A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240208&DB=EPODOC&CC=US&NR=2024042482A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CONSIDINE, Timothy</creatorcontrib><creatorcontrib>SZIKLAS, Laurie</creatorcontrib><creatorcontrib>KHAYRULLIN, Ilyas I</creatorcontrib><creatorcontrib>LIN, Howard</creatorcontrib><creatorcontrib>BRAUN, Tim</creatorcontrib><creatorcontrib>FRAYER, Maxim</creatorcontrib><creatorcontrib>TICE, Kerry</creatorcontrib><creatorcontrib>GHOSH, Amalkumar P</creatorcontrib><creatorcontrib>VAZAN, Fridrich</creatorcontrib><creatorcontrib>ZHAO, Fangchao</creatorcontrib><title>EVAPORATION SYSTEM HAVING IMPROVED COLLIMATION</title><description>A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a three-point plurality of point evaporation sources disposed adjacent to the central axis of the substrate and at a distance from the substrate whereby the nozzle assembly provides for molecules of evaporated material to arrive at the substrate at an incident angle of less than or equal to 5 degrees.</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBzDXMM8A9yDPH091MIjgwOcfVV8HAM8_RzV_D0DQjyD3N1UXD29_Hx9AUr4WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgZGJgYmRiYWRo6GxsSpAgCpgicM</recordid><startdate>20240208</startdate><enddate>20240208</enddate><creator>CONSIDINE, Timothy</creator><creator>SZIKLAS, Laurie</creator><creator>KHAYRULLIN, Ilyas I</creator><creator>LIN, Howard</creator><creator>BRAUN, Tim</creator><creator>FRAYER, Maxim</creator><creator>TICE, Kerry</creator><creator>GHOSH, Amalkumar P</creator><creator>VAZAN, Fridrich</creator><creator>ZHAO, Fangchao</creator><scope>EVB</scope></search><sort><creationdate>20240208</creationdate><title>EVAPORATION SYSTEM HAVING IMPROVED COLLIMATION</title><author>CONSIDINE, Timothy ; SZIKLAS, Laurie ; KHAYRULLIN, Ilyas I ; LIN, Howard ; BRAUN, Tim ; FRAYER, Maxim ; TICE, Kerry ; GHOSH, Amalkumar P ; VAZAN, Fridrich ; ZHAO, Fangchao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2024042482A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>CONSIDINE, Timothy</creatorcontrib><creatorcontrib>SZIKLAS, Laurie</creatorcontrib><creatorcontrib>KHAYRULLIN, Ilyas I</creatorcontrib><creatorcontrib>LIN, Howard</creatorcontrib><creatorcontrib>BRAUN, Tim</creatorcontrib><creatorcontrib>FRAYER, Maxim</creatorcontrib><creatorcontrib>TICE, Kerry</creatorcontrib><creatorcontrib>GHOSH, Amalkumar P</creatorcontrib><creatorcontrib>VAZAN, Fridrich</creatorcontrib><creatorcontrib>ZHAO, Fangchao</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CONSIDINE, Timothy</au><au>SZIKLAS, Laurie</au><au>KHAYRULLIN, Ilyas I</au><au>LIN, Howard</au><au>BRAUN, Tim</au><au>FRAYER, Maxim</au><au>TICE, Kerry</au><au>GHOSH, Amalkumar P</au><au>VAZAN, Fridrich</au><au>ZHAO, Fangchao</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EVAPORATION SYSTEM HAVING IMPROVED COLLIMATION</title><date>2024-02-08</date><risdate>2024</risdate><abstract>A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a three-point plurality of point evaporation sources disposed adjacent to the central axis of the substrate and at a distance from the substrate whereby the nozzle assembly provides for molecules of evaporated material to arrive at the substrate at an incident angle of less than or equal to 5 degrees.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
title | EVAPORATION SYSTEM HAVING IMPROVED COLLIMATION |
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