ELECTROSTATIC CHUCK FOR USE IN SEMICONDUCTOR PROCESSING

A semiconductor substrate processing apparatus includes a vacuum chamber having a processing zone in which a semiconductor substrate may be processed, a process gas source in fluid communication with the vacuum chamber for supplying a process gas into the vacuum chamber, a showerhead module through...

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Bibliographische Detailangaben
1. Verfasser: GOMM, Troy Alan
Format: Patent
Sprache:eng
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