WAFER CLEANING APPARATUS AND METHOD

The present disclosure relates to an apparatus for wafer cleaning. The apparatus includes an enclosure made of a noncombustible material, a wafer holder, a cleaning nozzle, at least one sensor, and an exhaust unit. The wafer holder can hold and heat a wafer. The cleaning nozzle can supply a flow of...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Huang, Ping-Jung, HUANG, Jieh-Chau, Hsia, Pei Yen, Yen, Bi-Ming, Hu, Hung-Lung, Hsia, Ying Ting
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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