A SYSTEM AND METHOD FOR PERFORMING ALIGNMENT AND OVERLAY MEASUREMENT THROUGH AN OPAQUE LAYER

An alignment or overlay target that has an optically opaque layer disposed between the top and bottom target structure is measured using opto-acoustic metrology. A classifier library is generated for classifying whether an opto-acoustic metrology signal is on or off the bottom structure. A target ma...

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Hauptverfasser:	Mehendale, Manjusha, Mair, Robin A, Antonelli, George Andrew, Mukundhan, Priya, Vozzo, Francis C
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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