STACKABLE PLASMA SOURCE FOR PLASMA PROCESSING

STACKABLE PLASMA SOURCE FOR PLASMA PROCESSING

A system, method, and apparatus for processing substrates. A plasma generation assembly includes a support structure configured to be disposed within a processing chamber, the support structure forming a set of ducts. The plasma generation assembly further includes a plasma generation cell selective...

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Hauptverfasser: George, Rene, Nagorny, Vladimir
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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creator George, Rene
Nagorny, Vladimir
description A system, method, and apparatus for processing substrates. A plasma generation assembly includes a support structure configured to be disposed within a processing chamber, the support structure forming a set of ducts. The plasma generation assembly further includes a plasma generation cell selectively removable from and selectively replaceable within one of set of ducts. The plasma generation cell includes a dielectric barrier discharge (DBD) structure. The DBD structure includes a set of electrodes disposed along a first dielectric surface and covered by a second dielectric layer. The DBD structure is configured to initiate plasma discharge within the processing chamber. The DBD structure further includes electrical terminals coupled the DBD structure with an electric driving network.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title STACKABLE PLASMA SOURCE FOR PLASMA PROCESSING
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