SEMICONDUCTOR DEVICES

A semiconductor device includes a first isolation structure extending through an upper portion of a substrate and defining a first active region, a first gate structure on the substrate, and first source/drain regions at upper portions of the first active region adjacent to the first gate structure....

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Hauptverfasser: Lee, Sohyun, Yun, Kangoh, Lee, Dongjin, Lim, Junhee
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creator Lee, Sohyun
Yun, Kangoh
Lee, Dongjin
Lim, Junhee
description A semiconductor device includes a first isolation structure extending through an upper portion of a substrate and defining a first active region, a first gate structure on the substrate, and first source/drain regions at upper portions of the first active region adjacent to the first gate structure. The first isolation structure includes an upper isolation pattern structure and a lower isolation pattern. The upper isolation pattern structure includes a first isolation pattern and a second isolation pattern covering a sidewall of the first isolation pattern. The lower isolation pattern is formed under and contacting the upper isolation pattern structure, and a width of the lower isolation pattern is greater than a width of the upper isolation pattern structure.
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The first isolation structure includes an upper isolation pattern structure and a lower isolation pattern. The upper isolation pattern structure includes a first isolation pattern and a second isolation pattern covering a sidewall of the first isolation pattern. 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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title SEMICONDUCTOR DEVICES
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