STRUCTURE INCLUDING DISCRETE DIELECTRIC MEMBER FOR PROTECTING FIRST AIR GAP DURING FORMING OF SECOND AIR GAP

A structure includes a first air gap including a first opening defined in a first dielectric layer and a second dielectric layer over the first opening and closing an end portion of the first opening. A second air gap may be over at least a portion of the first air gap. The second air gap includes a...

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Bibliographische Detailangaben
Hauptverfasser: Hsieh, Curtis Chun-I, Yi, Wanbing, Tan, Juan Boon, Hsu, Wei-Hui
Format: Patent
Sprache:eng
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