BONDING STRUCTURES OF INTEGRATED CIRCUIT DEVICES AND METHOD FORMING THE SAME

A method includes forming a conductive pad over an interconnect structure of a wafer, forming a capping layer over the conductive pad, forming a dielectric layer covering the capping layer, and etching the dielectric layer to form an opening in the dielectric layer. The capping layer is exposed to t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Yang, Ku-Feng, Chiou, Wen-Chih, Tsai, Chen-Yu
Format: Patent
Sprache:eng
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