ARYL, HETEROARYL, AND HETEROCYCLIC PHARMACEUTICAL COMPOUNDS FOR TREATMENT OF MEDICAL DISORDERS
Complement Factor D inhibitors, pharmaceutical compositions, and uses thereof, as well as processes for their manufacture are provided. The compounds provided include Formula I, Formula II, Formula III, Formula IV, and Formula V, or a pharmaceutically acceptable salt, prodrug, isotopic analog, N-oxi...
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| creator | GADHACHANDA, Venkat Rao PAIS, Godwin BARRISH, Joel Charles WANG, Xiangzhu HASHIMOTO, Akihiro DESHPANDE, Milind AGARWAL, Atul WANG, Qiuping GREENLEE, William WILES, Jason Allan PHADKE, Avinash S EASTMAN, Kyle J CHEN, Dawei |
| description | Complement Factor D inhibitors, pharmaceutical compositions, and uses thereof, as well as processes for their manufacture are provided. The compounds provided include Formula I, Formula II, Formula III, Formula IV, and Formula V, or a pharmaceutically acceptable salt, prodrug, isotopic analog, N-oxide, or isolated isomer thereof, optionally in a pharmaceutically acceptable composition. The inhibitors described herein target Factor D and inhibit or regulate the complement cascade. |
| format | Patent |
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The compounds provided include Formula I, Formula II, Formula III, Formula IV, and Formula V, or a pharmaceutically acceptable salt, prodrug, isotopic analog, N-oxide, or isolated isomer thereof, optionally in a pharmaceutically acceptable composition. 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The compounds provided include Formula I, Formula II, Formula III, Formula IV, and Formula V, or a pharmaceutically acceptable salt, prodrug, isotopic analog, N-oxide, or isolated isomer thereof, optionally in a pharmaceutically acceptable composition. The inhibitors described herein target Factor D and inhibit or regulate the complement cascade.</description><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>CHEMISTRY</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNirsKwkAQANNYiPoPC7YKJkEk5bK3IYF7hL27Io0hyFmJBuL_I2g-wGpmYNbZFaXXB2g4sLifo1VLU0-6JegaFIPEMbSEGsiZzkWrPNROIAhjMGwDuBoMq--iWu9EsfhttrqPjzntFm6yfc2BmmOaXkOap_GWnuk9RF-cirI8X_Kqwrz87_oA7T4z9A</recordid><startdate>20231109</startdate><enddate>20231109</enddate><creator>GADHACHANDA, Venkat Rao</creator><creator>PAIS, Godwin</creator><creator>BARRISH, Joel Charles</creator><creator>WANG, Xiangzhu</creator><creator>HASHIMOTO, Akihiro</creator><creator>DESHPANDE, Milind</creator><creator>AGARWAL, Atul</creator><creator>WANG, Qiuping</creator><creator>GREENLEE, William</creator><creator>WILES, Jason Allan</creator><creator>PHADKE, Avinash S</creator><creator>EASTMAN, Kyle J</creator><creator>CHEN, Dawei</creator><scope>EVB</scope></search><sort><creationdate>20231109</creationdate><title>ARYL, HETEROARYL, AND HETEROCYCLIC PHARMACEUTICAL COMPOUNDS FOR TREATMENT OF MEDICAL DISORDERS</title><author>GADHACHANDA, Venkat Rao ; PAIS, Godwin ; BARRISH, Joel Charles ; WANG, Xiangzhu ; HASHIMOTO, Akihiro ; DESHPANDE, Milind ; AGARWAL, Atul ; WANG, Qiuping ; GREENLEE, William ; WILES, Jason Allan ; PHADKE, Avinash S ; EASTMAN, Kyle J ; CHEN, Dawei</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2023357199A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>CHEMISTRY</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><toplevel>online_resources</toplevel><creatorcontrib>GADHACHANDA, Venkat Rao</creatorcontrib><creatorcontrib>PAIS, Godwin</creatorcontrib><creatorcontrib>BARRISH, Joel Charles</creatorcontrib><creatorcontrib>WANG, Xiangzhu</creatorcontrib><creatorcontrib>HASHIMOTO, Akihiro</creatorcontrib><creatorcontrib>DESHPANDE, Milind</creatorcontrib><creatorcontrib>AGARWAL, Atul</creatorcontrib><creatorcontrib>WANG, Qiuping</creatorcontrib><creatorcontrib>GREENLEE, William</creatorcontrib><creatorcontrib>WILES, Jason Allan</creatorcontrib><creatorcontrib>PHADKE, Avinash S</creatorcontrib><creatorcontrib>EASTMAN, Kyle J</creatorcontrib><creatorcontrib>CHEN, Dawei</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GADHACHANDA, Venkat Rao</au><au>PAIS, Godwin</au><au>BARRISH, Joel Charles</au><au>WANG, Xiangzhu</au><au>HASHIMOTO, Akihiro</au><au>DESHPANDE, Milind</au><au>AGARWAL, Atul</au><au>WANG, Qiuping</au><au>GREENLEE, William</au><au>WILES, Jason Allan</au><au>PHADKE, Avinash S</au><au>EASTMAN, Kyle J</au><au>CHEN, Dawei</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ARYL, HETEROARYL, AND HETEROCYCLIC PHARMACEUTICAL COMPOUNDS FOR TREATMENT OF MEDICAL DISORDERS</title><date>2023-11-09</date><risdate>2023</risdate><abstract>Complement Factor D inhibitors, pharmaceutical compositions, and uses thereof, as well as processes for their manufacture are provided. The compounds provided include Formula I, Formula II, Formula III, Formula IV, and Formula V, or a pharmaceutically acceptable salt, prodrug, isotopic analog, N-oxide, or isolated isomer thereof, optionally in a pharmaceutically acceptable composition. The inhibitors described herein target Factor D and inhibit or regulate the complement cascade.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMISTRY HETEROCYCLIC COMPOUNDS METALLURGY ORGANIC CHEMISTRY |
| title | ARYL, HETEROARYL, AND HETEROCYCLIC PHARMACEUTICAL COMPOUNDS FOR TREATMENT OF MEDICAL DISORDERS |
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